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[1 - Example of a procedure using ammonium fluoride as an etchant and polymer brushes] for visulaisation
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News
- Project Runway All Stars Recap: "Patterning for Piggy"
Project Runway, Patterning for Piggy, Season 10, Episode 3: The all-star designers ham it up when they create an elegant cocktail dress for one of the most demanding prima donnas in the entertainment industry: Miss Piggy. - Nikon Ships New Immersion Scanner Delivering Industry-Leading Performance and Productivity
Nikon Corporation announced that the NSR-S621D ArF immersion scanner began shipping to IC manufacturers in January to deliver ultra-high productivity and superior overlay accuracy for the most demanding immersion double patterning layers. - Gigaphoton Shipping the "GT63A" - The Next-Generation ArF Excimer Laser for Multi-Patterning Immersion Lithography
Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for multi-patterni - Uganda's ugly vendetta weapon: acid
Outside the burns ward of Kampala's Mulago hospital, Darlison Kobusingye gingerly adjusts the headscarf she uses to cover the worst of the scars patterning the right side of her face. - Imec Announces World's First 300mm Fab-Compatible Directed Self-Assembly Process Line
At next week's SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world's first 300mm fab-compatible Directed Self-Assembly (DSA) process line all under one roof in imec's 300mm cleanroom fab. - Graphene could be a perfect absorber of light
Periodic patterning confines light, claim physicists - TEL Joins the CEA-Leti Industrial Programs IMAGINE and IDEAL to Prepare the Introduction of ML2 and DSA Lithography ...
TEL and CEA-Leti announced that TEL will join IMAGINE and IDEAL, two open and collaborative industrial programs on lithography launched by CEA-Leti. Through this decision, TEL will - Imec rolls 300mm directed self-assembly process line
Imec has developed what it touts as the world's first 300mm fab-compatible directed self-assembly (DSA) process line within its pilot fab. The research institute collaborated with the University of Wisconsin, AZ Electronic Materials and Tokyo Electron Ltd in this technology to improve optical and extreme ultraviolet (EUV) lithography. - Briefly: QDM offers scholarship
In 2012, the Quality Deer Management Association will award six deserving students with scholarships to attend a deer steward course. - Novellus Introduces VECTOR(R) Strata(TM) for Next Generation, Vertically Integrated Memory (VIM) Technology
New System Designed for Leading Memory Manufacturers Enables Ease of Patterning and High Yield at a Low Cost of Ownership