Pressure control of rf bias for sputtering


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    • IEEE  status
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      Views: (2001)   Date: (Publication Date: Dec 1976)   Pages: ()
    • Author:  Kochel  L. J. Sperry-Univac Computer Systems  Univac Park  St. Paul  Minnesota 55165;  

    • Abstract:  Abstract A method of simultaneously controlling vacuum pressure and substrate bias using only a pressure controller is described for an rf bias sputtering system in which the bias is developed through substrate tuning.

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