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Views: (2000) Date: (Publication Date: Mar 1992) Pages: () |
Abstract: Abstract We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry provides excellent precision for films as thin as 30 Å and as thick as 20?000 Å. The technique is also capable of simultaneous 2 and 3 parameter measurements and it performs all measurements with a submicron spot size.