High Resolution Monitoring of Implant and Anneal Uniformity Using Therma-Probe Technology


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    • IEEE  status
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      		Views: (2002)   Date: (Publication Date: 5-7 May 2008)   Pages: ()

    • Author:  Shaughnessy  D. Mirshad  I. Salnik  A. Nicolaides  L. KLA-Tencor Corp.  San Jose  CA;  

    • Abstract:  Abstract A new advanced application of the therma-probe systems for high-resolution mapping of implant and anneal non-uniformities is described.

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